Cu ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a cylindrical Cu-Ga alloy sputtering target formed by a simple formation method, capable of suppressing generation of chipping in a machine work, or preventing a crack.SOLUTION: A Cu-Ga alloy sputtering target is a cylindrical casting by a Cu alloy containing Ga:27.0-30.0 atom%. The casting has a two-phase coexistent structure in which a ζ-phase of the Cu alloy is dispersed into a γ-phase of the Cu alloy, and the area ratio of the ζ-phase is 5.0-70.0%, and an average divided length related to the ζ-phase is 10.0-300.0 μm.SELECTED DRAWING: None