发明名称 PRODUCTION METHOD OF ALUMINUM-CONTAINING OXIDE THIN FILM, AND ALUMINUM-CONTAINING OXIDE THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a production method of an aluminium-containing oxide thin film capable of improving a deposition rate of the aluminium-containing oxide thin film, and to provide an aluminium-containing oxide thin film produced by the production method.SOLUTION: An aluminium-containing oxide thin film is deposited by an atomic layer deposition method by using an aluminium-containing composition containing trimethylaluminum and dimethylaluminum hydride and an oxygen-containing compound containing oxygen atoms as raw materials.SELECTED DRAWING: None
申请公布号 JP2016141882(A) 申请公布日期 2016.08.08
申请号 JP20150021329 申请日期 2015.02.05
申请人 NIPPON ALKYL ALUM KK;TOKYO INSTITUTE OF TECHNOLOGY 发明人 TAKAHASHI KIYOSHI;MIYAJIMA SHINSUKE
分类号 C23C16/40;C23C16/455;H01L21/316 主分类号 C23C16/40
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