发明名称 |
PRODUCTION METHOD OF ALUMINUM-CONTAINING OXIDE THIN FILM, AND ALUMINUM-CONTAINING OXIDE THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a production method of an aluminium-containing oxide thin film capable of improving a deposition rate of the aluminium-containing oxide thin film, and to provide an aluminium-containing oxide thin film produced by the production method.SOLUTION: An aluminium-containing oxide thin film is deposited by an atomic layer deposition method by using an aluminium-containing composition containing trimethylaluminum and dimethylaluminum hydride and an oxygen-containing compound containing oxygen atoms as raw materials.SELECTED DRAWING: None |
申请公布号 |
JP2016141882(A) |
申请公布日期 |
2016.08.08 |
申请号 |
JP20150021329 |
申请日期 |
2015.02.05 |
申请人 |
NIPPON ALKYL ALUM KK;TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
TAKAHASHI KIYOSHI;MIYAJIMA SHINSUKE |
分类号 |
C23C16/40;C23C16/455;H01L21/316 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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