METHOD AND SYSTEM FOR DETECTING DEFECT

摘要

PROBLEM TO BE SOLVED: To provide a system, a method and a computer program product for detecting a defect, especially the defect in a mask used for a photolithographic process.

SOLUTION: The method includes: (i) a step 150 for searching second pixels in a second image corresponding to previously-tested pixels in a first image of an object, and acquiring the first and second images by using different acquisition methods; (ii) a step 160 for searching third pixels in the second image in which adjacent portions of the second and third pixels are similar; (iii) a step 170 for searching fourth pixels in the first image corresponding to the third pixels; and (iv) a step 180 for comparing the previously-tested pixels with the fourth pixels.

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