发明名称 On-site ammonia purification for semiconductor manufacture
摘要 Highly purified ammonia for use in semiconductor manufacturing is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrubbing the filtered vapor in a high-pH aqueous scrubber.
申请公布号 US5846386(A) 申请公布日期 1998.12.08
申请号 US19960674110 申请日期 1996.07.01
申请人 STARTEC VENTURES, INC. 发明人 HOFFMAN, JOE G.;CLARK, R. SCOTT
分类号 C01B7/07;C01B7/19;C01C1/02;C01C1/16;H01L21/00;(IPC1-7):C01B21/44;B01D3/00 主分类号 C01B7/07
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