| 摘要 |
PCT No. PCT/EP97/05054 Sec. 371 Date Apr. 28, 1999 Sec. 102(e) Date Apr. 28, 1999 PCT Filed Sep. 16, 1997 PCT Pub. No. WO98/19328 PCT Pub. Date May 7, 1998A device for the treatment of substrates has a container filled with a treatment fluid and at least one receiving device for lifting substrates or at least one substrate carrier out of the treatment fluid. The receiving device has a fluid suction device with suction openings and the suction openings are connected to a vacuum source. The suction openings are provided for removal of residual fluid from the substrates or the at least one substrate carrier after lifting of the substrates or the substrate carrier from the fluid. The suction openings are arranged in the vicinity of lower areas of the substrates or the substrate carrier, wherein the lower areas are located adjacent to the receiving device.
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