Fabrication of microkeratome blade with alignment features

摘要

Various methods relating to one or more registration features (94) associated with a cutting blade (56) are disclosed. A masking layer (118) is formed on a wafer (130) and is patterned to define a plurality of mask apertures (122a-c). An anisotropic etch simultaneously forms a first cutting edge surface (72) and at least one registration surface (94) for the blade (56) via the mask apertures 122a and 122b, respectively. The anisotropic etch stops at the same crystallographic plane for both the first cutting edge surface (72) and the registration surface(s) (94). This may be used to accurately register a cutting edge (80) of the blade (56) relative to one or more structures that may be associated with the blade (56).