AN PHOTORESIST EDGE BEAN REMOVAL APPARATUS AND METHOD THEREOF

摘要

A photoresist particle restraining apparatus in a coater and a method thereof are provided to improve the yield of semiconductor devices by preventing the transition of thinner and photoresist particles to a front surface of a wafer using a nitrogen spraying unit. A photoresist particle restraining apparatus includes a thinner spraying unit and a nitrogen spraying unit. The thinner spraying unit(120) is used for spraying a thinner onto a rear surface of a wafer. The nitrogen spraying unit(130) is installed in front of the wafer opposite to a thinner spraying region.