发明名称 POSITIVE DISPLACEMENT PUMPING CHAMBER
摘要 A substrate processing system as illustrated at (1). A substrate (2) lies upon a piston (3) shown in both the loading position (3a) and in a processing position (3b). The substrate is loaded via a port (4) through a door (5). The loading area (7a), and/or the hole chamber (7) may be pumped out via a vacuum exhaust pipe (6) connected to a pump (not shown). A linear drive mechanism shown diagrammatically at (8) lifts the piston and the substrate in the chamber such that a process volume (7b) of the chamber is defined with poor gas conduction between the piston and the walls of the chamber.
申请公布号 WO2007042797(A1) 申请公布日期 2007.04.19
申请号 WO2006GB03766 申请日期 2006.10.11
申请人 AVIZA TECHNOLOGIES LIMITED;BRANCHER, CARL, DAVID, M.;MACNEIL, JOHN;TROWELL, ROBERT, KENNETH 发明人 BRANCHER, CARL, DAVID, M.;MACNEIL, JOHN;TROWELL, ROBERT, KENNETH
分类号 H01L21/00;C23C16/455 主分类号 H01L21/00
代理机构 代理人
主权项
地址