| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection method of a pattern and an inspection device of the pattern capable of detecting accurately a defect even when an interference fringe (moire) is generated, and a manufacturing method of an electronic device. SOLUTION: This inspection method of the pattern for inspecting by imaging a pattern on an inspection object has characteristics wherein an imaged image is divided to generate a plurality of inspection images, and a reference image is generated based on periodical information carried by the inspection image, and the phase of the reference image is allowed to agree with the phase of the inspection image, and the amplitude of the reference image whose phase is allowed to agree therewith is allowed to agree with the amplitude of the inspection image, and the reference image whose amplitude is allowed to agree therewith is sampled, to thereby restore the inspection image. COPYRIGHT: (C)2008,JPO&INPIT
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