| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a multilevel gradation mask that can be manufactured in relatively simple processes with relatively easy designing of transmittance and without requiring a plurality of etching techniques. <P>SOLUTION: The gradation mask comprises a transparent substrate, a light-shielding film formed as a pattern and a semitransparent film having a function of adjusting transmittance on the transparent substrate, and has a transparent region having only the transparent substrate, a light-shielding region where the main pattern of the light-shielding film is formed on the transparent substrate, and a second semitransparent region where only an auxiliary pattern of the semitransparent film is formed on the transparent substrate and either the auxiliary pattern or an opening of the semitransparent film has a dimension smaller than the resolution limit. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
