| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate support unit that can improve the substrate processing efficiency at processings. <P>SOLUTION: This substrate support unit performs the processing to float and rotate the substrate from the top of a chuck plate, by providing a rotating flow to the substrate at processings. Consequently, the present invention supports the substrate by making it float from the top of a chuck plate by a noncontact method at processings, and make it rotate at the processing speed. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
