Epitaxial wafer and method of manufacturing the same

摘要

A method of manufacturing an epitaxial wafer, including a silicon substrate having a surface sliced from single-crystalline silicon and a silicon epitaxial layer deposited on the surface of the silicon substrate, includes an oxygen concentration controlling heat treatment process in which a heat treatment of the epitaxial layer is performed under a non-oxidizing atmosphere after the epitaxial growth such that an oxygen concentration of the surface of the silicon epitaxial layer is set to 1.0×1017 to 12×1017 atoms/cm3 (ASTM F-121, 1979).

主权项

1. A method of manufacturing an epitaxial wafer including a silicon substrate which has a surface, and a silicon epitaxial layer deposited on the surface of the silicon substrate, the method comprising:
slicing a silicon substrate from a single-crystalline ingot grown with a low-oxygen concentration of 1.0×1017 to 8.0×1017 atoms/cm3 (ASTM F-121, 1979); depositing a silicon epitaxial layer on the surface of the silicon substrate; an oxygen concentration controlling heat treatment process in which an oxygen concentration of the surface of the silicon epitaxial layer is set to 1.0×1017 to 12×1017 atoms/cm3 (ASTM F-121, 1979), the oxygen concentration controlling heat treatment process including heating the silicon epitaxial layer under an oxidizing atmosphere to form an oxide film on the silicon epitaxial layer and an oxide film removal process for removing the oxide film by grinding or etching; and a process of forming a strained layer, which generates a film stress of 10 to 1,000 MPa, on the surface of the silicon epitaxial layer, wherein the thickness of the silicon epitaxial layer is 2 μm or less, and the heating in the oxygen concentration controlling heat treatment process is conducted in a treatment condition including a treatment temperature X(° C.) and a treatment time Y(sec) under an oxidizing atmosphere including oxygen after the epitaxial growth, wherein the treatment temperature X is set to 1,000° C. to 1,250° C. and the treatment time Y is set to 26 minutes to 0.023 minutes while the treatment temperature X and the treatment time Y satisfy the following relationship:
Y≧1.21×1010exp(−0.0176X).