发明名称 Charged particle beam device and sample preparation method
摘要 Provided is a charged particle beam device provided with: a charged particle source; an objective lens for focusing a charged particle beam emitted from the charged particle source onto a sample; a detector for detecting a secondary charged particle emitted from the sample; a probe capable of coming into contact with the sample; a gas nozzle for emitting conductive gas to the sample; and a control unit for controlling the drive of the probe and gas emission from the gas nozzle, wherein before bringing the probe into contact with the sample after applying the charged particle beam to the sample to machine the sample, the control unit emits gas toward a machining position from the gas nozzle and applies the charged particle beam to form a conductive film on a machining portion of the sample, and the charged particle beam device is provided with a contact detection unit for determining that the conductive film formed on the machining portion and the probe have come into contact with each other.
申请公布号 US9362088(B2) 申请公布日期 2016.06.07
申请号 US201314434687 申请日期 2013.10.09
申请人 Hitachi High-Technologies Corporation 发明人 Sato Takahiro;Morikawa Akinari;Sekihara Isamu
分类号 H01J37/317;G01N1/28;H01J37/28;H01J37/30;H01J37/31 主分类号 H01J37/317
代理机构 Crowell & Moring LLP 代理人 Crowell & Moring LLP
主权项 1. A charged particle beam device comprising: a charged particle source; an objective lens configured to focus a charged particle beam emitted from said charged particle source onto a sample; a detector configured to detect secondary charged particles to be emitted from said sample; a probe capable of coming into contact with said sample; a gas nozzle configured to emit a conductive gas to said sample; and a control unit configured to control driving of said probe and gas emission from said gas nozzle, wherein said control unit has a contact detection unit, wherein after having applied processing by irradiating the charged particle beam to said sample so as to separate a part of said sample as a micro-sample, a conductive film is formed on said micro-sample by emitting the gas from said gas nozzle toward said micro-sample and simultaneously irradiating said charged particle beam prior to fastening one surface of the micro-sample processed by said probe on a sample table, and wherein said contact detection unit detects electrical conduction between said micro-sample and said sample table.
地址 Tokyo JP