发明名称 LAMP UNIT
摘要 A light deflecting device selectively reflects an incident light to a projection optical system. An irradiation optical system irradiates light to a reflective part of the light deflecting device. The light deflecting device has at least some region in the reflective part, a position of which is switchable between a first reflection position where the light irradiated by the irradiation optical system is reflected toward the projection optical system so as to be effectively used as a portion of a desired light distribution pattern, and a second reflection position where the light irradiated by the irradiation optical system is reflected so as not to be effectively used. The irradiation optical system is disposed at a position shifted to a side which a front face of the reflective part in the first reflection position faces, with reference to a vertical plane including an optical axis of the projection optical system.
申请公布号 US2016161074(A1) 申请公布日期 2016.06.09
申请号 US201514958356 申请日期 2015.12.03
申请人 KOITO MANUFACTURING CO., LTD. 发明人 Yagi Takayuki;Nakazawa Misako
分类号 F21S8/10;F21V7/06 主分类号 F21S8/10
代理机构 代理人
主权项 1. A lamp unit comprising: a projection optical system; a light deflecting device having a reflective part, the light deflecting device being disposed on an optical axis of the projection optical system and configured to selectively reflect an incident light to the projection optical system; and an irradiation optical system configured to irradiate light to the reflective part of the light deflecting device, wherein the light deflecting device has at least some region in the reflective part, a position of which is switchable between a first reflection position where the light irradiated by the irradiation optical system is reflected toward the projection optical system so as to be effectively used as a portion of a desired light distribution pattern, and a second reflection position where the light irradiated by the irradiation optical system is reflected so as not to be effectively used, and wherein the irradiation optical system is disposed at a position shifted to a side which a front face of the reflective part in the first reflection position faces, with reference to a vertical plane including the optical axis of the projection optical system.
地址 Tokyo JP