发明名称 |
PROCESS FOR THE NANOSTRUCTURING OF A BLOCK COPOLYMER FILM USING A NONSTRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND ON METHYL METHACRYLATE, AND NANOSTRUCTURED BLOCK COPOLYMER FILM |
摘要 |
The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks. |
申请公布号 |
SG11201604475W(A) |
申请公布日期 |
2016.07.28 |
申请号 |
SG11201604475W |
申请日期 |
2014.12.15 |
申请人 |
ARKEMA FRANCE |
发明人 |
NAVARRO, CHRISTOPHE;NICOLET, CÉLIA;CHEVALIER, XAVIER |
分类号 |
B82Y30/00;C08F293/00;C09D153/00 |
主分类号 |
B82Y30/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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