HARDWARE AND PROCESS FOR FILM UNIFORMITY IMPROVEMENT
摘要
The present inventors have conceived of a multi-stage process gas delivery system for use in a substrate processing apparatus. In certain implementations, a first process gas may first be delivered to a substrate in a substrate processing chamber. A second process gas may be delivered, at a later time, to the substrate to aid in the even dosing of the substrate. Delivery of the first process gas and the second process gas may cease at the same time or may cease at separate times.
申请公布号
SG10201510078Q(A)
申请公布日期
2016.07.28
申请号
SG10201510078Q
申请日期
2015.12.08
申请人
LAM RESEARCH CORPORATION
发明人
KUMAR, PURUSHOTTAM;KANG, HU;LAVOIE, ADRIEN;CHIU, YI CHUNG;PASQUALE, FRANK L.;QIAN, JUN;BALDASSERONI, CHLOE;SWAMINATHAN, SHANKAR;LEESER, KARL F.;SMITH, DAVID CHARLES;LAI, WEI-CHIH