A process for the formation of a patterned resist image upon a substrate comprises the steps of: (i) mechanically applying a layer of a suspension of a powdered solid photocurable material in a liquid carrier to the substrate; (ii) drying the resultant layer by evaporation of the liquid carrier and reflowing the powder, under the action of heat, to give a coherent film; (iii) imagewise exposing the dried film to radiation through a patterned mask whereby portions of the film exposed to radiation are cured; and (iv) subsequently developing the exposed film by removing unexposed portions thereof with an appropriate solvent.
申请公布号
WO9216877(A1)
申请公布日期
1992.10.01
申请号
WO1992GB00451
申请日期
1992.03.13
申请人
COATES BROTHERS PLC
发明人
IVORY, NICHOLAS, ERIC;JEFFRIES, MICHAEL;PALMER, ROBERT, JONES;THATCHER, WRENFORD, JOHN