发明名称 COMPOSITION FOR FORMING FERROELECTRIC FILM, ITS MANUFACTURING METHOD AND MANUFACTURING METHOD OF FERROELECTRIC FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for forming a ferroelectric film which can form a ferroelectric film by an MOD method and by a low temperature firing, and to provide its manufacturing method and a manufacturing method of a ferroelectric film using it. <P>SOLUTION: The composition for forming a ferroelectric film is one that is used for forming a ferroelectric film by the MOD method and contains an organometallic compound containing lead (Pb) and zirconium (Zr) and a methyl group and a carboxylate group, and a compound of a metal other than lead and zirconium. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008120644(A) 申请公布日期 2008.05.29
申请号 JP20060308368 申请日期 2006.11.14
申请人 SEIKO EPSON CORP 发明人 KAMEI HIROYUKI
分类号 C04B35/49;C04B35/491;H01L41/187;H01L41/39;H01L41/43 主分类号 C04B35/49
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