METHOD FOR PREPARING ZNO NANO-CRYSTAL DIRECTLY ON THE SILICON SUBSTRATE

摘要

A method for forming a ZnO nano-crystal directly on a silicon substrate is provided to omit additional processes when forming a silicon substrate based photoelectric cell by forming the amorphous ZnO-nano crystal within a Zn-Si-O complex thin film directly. In a method for forming a ZnO nano-crystal directly on a silicon substrate, a Zn-Si-O complex thin film is formed on a semiconductor substrate, and the Zn-Si-O complex thin film is annealed. Wherein, the ZnO nano crystal is formed within an amorphous Zn-Si-O complex thin film on a silicon substrate, and the Zn-Si-O complex thin film is formed by using a sputtering method.