| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an effective OPC technique, using a hierarchical data structure for designing a high-density mask that requires coloring. <P>SOLUTION: A mask layout that requires coloring, such as, alternating phase shift mask, double-exposure mask and double-exposure etching mask is organized into uncolored hierarchical design units. Each hierarchical design unit is colored locally. Then, OPC is performed on the locally colored hierarchical design unit; the local coloring information for the OPC-modified design unit is discarded; after OPC modification, the uncolored OPC-modified design unit is placed within the mask layout, and the flattened data are colored; turnaround time for mask design is improved significantly, since the need to perform OPC on flattened data is avoided, while less intensive global coloring is performed on flattened data. <P>COPYRIGHT: (C)2008,JPO&INPIT |
