发明名称 HYDROGEN GAS SENSITIVE FILM AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a hydrogen gas sensitive film having favorable hydrogen gas sensitivity and a method of manufacturing the same.SOLUTION: A hydrogen gas sensitive film includes a catalyst layer on a lighting control layer made of tungsten oxide. The lighting control layer includes an irregular continuous hole to the boundary of the catalyst layer by detaching an internally generated object. Its manufacturing method includes: a base layer formation process for applying solution that is prepared by mixing halogenation tungsten with alcohol whose carbon number is 1 to 4 on a substrate to dry it; a protection layer formation process for applying solution prepared by mixing a platinum group metallic compound with organic solvent thereon; and an ultraviolent processing process in which by irradiating ultraviolet under reductive gas atmosphere, the halogenation tungsten is turned into tungsten oxide and the platinum group metal compound is turned into a platinum group metal.SELECTED DRAWING: Figure 2
申请公布号 JP2016161507(A) 申请公布日期 2016.09.05
申请号 JP20150042773 申请日期 2015.03.04
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 NISHIZAWA KAORI;YOSHIMURA KAZUNORI;YAMADA YASUMASA;TAJIMA KAZUKI;OKADA MASAHISA
分类号 G01N21/77;B01J23/652;B01J37/025;B01J37/18;B01J37/34;G01N21/78 主分类号 G01N21/77
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