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发明名称
Aligner and exposure method for manufacturing semiconductor device
摘要
申请公布号
US5270771(A)
申请公布日期
1993.12.14
申请号
US19920939713
申请日期
1992.09.02
申请人
CANON KABUSHIKI KAISHA
发明人
SATO, MAKOTO
分类号
G03F9/00;G03F7/20;G03F7/207;H01L21/027;H01L21/30;(IPC1-7):G03B27/52;G03B27/42
主分类号
G03F9/00
代理机构
代理人
主权项
地址
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