| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist removing solvent of high safety and detergency substituting for toluene or xylene, which is useful for washing and removal of a remaining resist at periphery and bottom part of a silicon wafer without remaining blurring or drips on that, especially after a rubber negative type resist is applied on the silicon wafer. SOLUTION: This solvent contains a mixture of at least one 6-20C aliphatic hydrocarbons. For the hydrocarbons, at least one aliphatic hydrocarbon selected from the group comprising a paraffinic hydrocarbon, an isoparaffinic hydrocarbon, and a naphthenic hydrocarbon is favorably usable. It is pref. that this resist is a rubber negative type resist. |
