| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a regenerated large-size photomask substrate that improves exposure accuracy, overlay accuracy and resolution, while exposing a high-definition large-size panel, reducing the load upon exposure correction and improving the yield of panels. <P>SOLUTION: A method for recycling a large-size photomask substrate includes steps of: removing a patterned light-shielding film from a used large-size photomask substrate to obtain a glass substrate stock for a large-size photomask to be regenerated; resurfacing the glass substrate stock for a large-size photomask by sand blasting; repolishing the resurfaced glass substrate stock for a large-size photomask to yield a regenerated glass substrate stock for a large-size photomask; applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated large-size photomask-forming blank; and processing the light-shielding film of the regenerated large-size photomask-forming blank into a pattern corresponding to the desired exposure of a mother glass to yield a regenerated photomask substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
