| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a thin-film removing apparatus and a method of removing a thin-film with which straightforwardness of the thin-film-removed face at a corner section of a square substrate is obtained and generation of mist is suppressed. <P>SOLUTION: A run-up stage 20, which has a flat run-up section 23 having a plane same as the substrate surface, is arranged close to a peripheral edge section of the substrate M loaded on a loading pedestal 22. A solvent is injected toward the peripheral edge section of the substrate M while a removing nozzle 30 is transferred along the peripheral edge section of the substrate M as well as the run-up stage 20 close thereto by the driving of a transfer mechanism 40, and the dissolved matter is sucked. The solvent is supplied from the removing nozzle 30 uniformly throughout from a side section to the corner section of the substrate M without changing the supply of the solvent and the suction condition, while the dissolved matter is sucked. Thereby, straightforwardness of the thin-film-removed face at the corner section of the substrate M is obtained, and generation of the mist is suppressed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
