Apparatus for removing solvent and photolithography apparatus using the same

摘要

A solvent removing apparatus is disclosed. One aspect includes a chamber, a first pump, a silencer, a valve, and a discharge unit. The chamber dries a coating layer formed on a substrate. The first pump intakes a solvent evaporated from the coating layer of the chamber and discharges the inhaled solvent. The silencer reduces discharge noise of the first pump and accommodates a liquefied solvent of the evaporated solvent provided from the first pump. The valve discharges the liquefied solvent accommodated in the silencer. The discharge unit discharges the evaporated solvent provided by the silencer.

主权项

1. A photolithography apparatus comprising:
a cleaning part configured to clean a substrate; a photoresist forming part configured to form a photoresist on the substrate; a solvent removing part configured to dry the photoresist so as to remove a solvent contained in the photoresist; an exposing part configured to expose the dried photoresist; and a developing part configured to develop the exposed photoresist, the solvent removing part comprising:
a chamber configured to dry the photoresist formed on a substrate;a first pump configured to intake an evaporated solvent from the chamber and discharge the evaporated solvent, wherein the evaporated solvent is evaporated from the photoresist;a silencer configured to reduce discharge noise of the first pump and accommodate a liquefied solvent of the evaporated solvent provided from the first pump;a valve configured to discharge the liquefied solvent accommodated in the silencer; anda discharge unit configured to discharge the evaporated solvent provided from the silencer.