| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring method capable of precisely measuring a synchronization error of a first stage supporting a reticle and a second stage supporting a substrate, in a scanning type exposure device. <P>SOLUTION: This invention relates to the measuring method of measuring the synchronization error of the first stage and the second stage in the scanning type exposure device, equipped with: the first stage supporting the reticle; the second stage supporting the substrate; and a projection optical system projecting a pattern of the reticle on the substrate, wherein there are provided: a measuring step of measuring a light intensity distribution formed by a measuring pattern by means of a test section, while carrying out synchronously scanning a mask for measuring with the measuring pattern arranged at the first stage and a test section arranged at the second stage; and a calculation step of computing the synchronization error of the first stage and the second stage based on a time variation of the light intensity distribution measured at the measuring step. <P>COPYRIGHT: (C)2008,JPO&INPIT |
