发明名称 |
Anti-reflective layer and method |
摘要 |
A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. |
申请公布号 |
US9436086(B2) |
申请公布日期 |
2016.09.06 |
申请号 |
US201615005435 |
申请日期 |
2016.01.25 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Su Yu-Chung;Chang Ching-Yu;Wang Wen-Yun |
分类号 |
G03F7/11;H01L21/027;H01L21/311;H01L21/02;G03F7/40;C08F220/18;C08F220/22 |
主分类号 |
G03F7/11 |
代理机构 |
Slater Matsil, LLP |
代理人 |
Slater Matsil, LLP |
主权项 |
1. A method of manufacturing a semiconductor device, the method comprising:
applying an anti-reflective coating onto a substrate, the anti-reflective coating comprising a first component and a second component, wherein prior to the applying the anti-reflective coating the first component has a constant concentration within the anti-reflective coating; and forming a first region and a second region within the anti-reflective coating, wherein the first region comprises a first concentration of the first component and a second concentration of the second component and wherein the second region comprises a third concentration of the first component and the second concentration of the second component, wherein the first concentration is at least 0.01% and the third concentration is different from the first concentration. |
地址 |
Hsin-Chu TW |