发明名称 Anti-reflective layer and method
摘要 A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom.
申请公布号 US9436086(B2) 申请公布日期 2016.09.06
申请号 US201615005435 申请日期 2016.01.25
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Su Yu-Chung;Chang Ching-Yu;Wang Wen-Yun
分类号 G03F7/11;H01L21/027;H01L21/311;H01L21/02;G03F7/40;C08F220/18;C08F220/22 主分类号 G03F7/11
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A method of manufacturing a semiconductor device, the method comprising: applying an anti-reflective coating onto a substrate, the anti-reflective coating comprising a first component and a second component, wherein prior to the applying the anti-reflective coating the first component has a constant concentration within the anti-reflective coating; and forming a first region and a second region within the anti-reflective coating, wherein the first region comprises a first concentration of the first component and a second concentration of the second component and wherein the second region comprises a third concentration of the first component and the second concentration of the second component, wherein the first concentration is at least 0.01% and the third concentration is different from the first concentration.
地址 Hsin-Chu TW