发明名称 APPARATUS AND METHOD FOR THE TREATMENT OF A SUBSTRATE WITH OZONE BUBBLES
摘要 Apparatus (200) for the treatment of one or more substrates comprising a treatment chamber configured to receive a liquid medium and one or more substrates; a supply of a treatment gas comprising ozone; and one or more conduits to convey said treatment gas to a bubble generator (41) wherein said bubble generator is operable to form bubbles of said treatment gas in said liquid medium, wherein the apparatus comprises a multiplicity of solid particles (46). A method of treating one or more substrates, the method comprising agitating said one or more substrates in a treatment formulation comprising a multiplicity of solid particles, a liquid medium and bubbles of ozone.
申请公布号 WO2016203252(A1) 申请公布日期 2016.12.22
申请号 WO2016GB51811 申请日期 2016.06.17
申请人 XEROS LIMITED 发明人 STEELE, John Edward;ZIMMERMAN, William Bauer Jay
分类号 D06F35/00 主分类号 D06F35/00
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