| 摘要 |
PURPOSE:To clarify the contrast between luminous parts and unluminous parts by putting the pattern, which is patterned on a lithgraphic film or the like, on a hologram and using blue light or ultraviolet rays to perform a second exposure and treating them with a developer whose alkalinity is lower than that at the time of hologram production. CONSTITUTION:An argon ion laser is used to generate interference fringes of a hologram 6 on a photoresist by the first exposure, and this photoresist is treated with a developer 5 having high alkalinity after exposure to produce the hologram 6. A pattern mask 7 is put on this hologram 6, and blue light or ultraviolet rays 8 are used to perform the second exposure, and they are treated with a developer 9 having low alkalinity. Since only photoresist parts irradiated by the second exposure are melted away (development does not progress up to parts which are not irradiated by the second exposure), patterning is improved.
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