| 发明名称 |
POLYMERIC ELECTRONIC AND X-RAY RESIST |
| 摘要 |
The polymeric electronic and x-ray resist is formed of homopolymers with copolymers (chlorofluoroalkyl)-2-propenoates of general formula CH2 = CX - COO - CH2 - R, where X is hydrogen or methyl, R is chlorodifluoromethyl (CF2Cl), chlorotetrafluoroethyl (C2ClF4), dichlorotrifluoroethyl (C2Cl2F3), trichlorodifluoroethyl (C2Cl3F2), chlorotrifluoroethyl (C2HClF3) and dichlorodifluoroethyl (C2HCl2F2) with molar weight Mw = 5x10<4> to 1x10<7> g.mol<-1>.
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| 申请公布号 |
CS273782(B1) |
申请公布日期 |
1991.04.11 |
| 申请号 |
CS19880008243 |
申请日期 |
1988.12.14 |
| 申请人 |
BEDNAR BOHUMIL DOC. ING. CSC.,CS;MAROUSEK VLADIMIR ING. CSC.,CS;ZACHOVAL JAROMIR ING. CSC.,CS;PALETA OLDRICH ING. CSC.,CS |
发明人 |
BEDNAR BOHUMIL DOC. ING. CSC.,CS;MAROUSEK VLADIMIR ING. CSC.,CS;ZACHOVAL JAROMIR ING. CSC.,CS;PALETA OLDRICH ING. CSC.,CS |
| 分类号 |
C08F20/24;(IPC1-7):C08F20/24 |
主分类号 |
C08F20/24 |
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