| 摘要 |
<p>PURPOSE:To obtain the method for forming the reticule which can effectively exhibit the effect of a phase shift and can improve resolving power by forming light shielding films with good accuracy relating to the method of forming the reticule improved in the resolving power by the self-aligning type phase shift. CONSTITUTION:This method is constituted by including a stage for side etching light shielding films 7c, 7d by an etching liquid with pattern films 8a, 8b and phase transition films 6a, 6b of photosensitive films as a mask in such a manner that light shielding films 7e, 7f of a 1st width remain, a stage for drying the pattern films 8a, 8b, light shielding films 7e, 7f, and phase transition films 6a, 6b of the photosensitive films and a stage for side etching the light shielding films again by the etching liquid in such a manner that the light shielding films 7a, 7f of the 2nd width narrower than the 1st width remain.</p> |
