| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treating device capable of forming a film high in quality at a high speed by preventing the film quality from being deteriorated due to the collision of charged particles. SOLUTION: The casing 2 of a surface treating device 1 is formed into two chambers of a plasma generating chamber 3 provided with plasma generating electrodes 5 and 5' and a substrate treating chamber 4 provided with a substrate supporting stand 8. A plasma blow-off port 6 is formed on the electrode 5' constituting the bulkhead of both chambers 3 and 4, and both chambers 3 and 4 are communicated. The nozzle shape of the plasma blow-off port 6 is set to the minimum cross-sectional area An of the blow-off port/the maximum cross-sectional area Ap of the plasma generating chamber <=1/2, the surface temp. of a substrate S is set to 100 to 550 deg.C, and the pressure in the substrate treating chamber 4 is set to 0.01 to 3 Torr.
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