发明名称 |
HOLDER FOR SEMICONDUCTOR OR LIQUID CRYSTAL PRODUCTION SYSTEM AND SEMICONDUCTOR OR LIQUID CRYSTAL PRODUCTION SYSTEM MOUNTING IT |
摘要 |
PROBLEM TO BE SOLVED: To provide a holder for a semiconductor or liquid crystal production system in which soaking properties are enhanced on the surface for holding an article to be processed, and to provide a semiconductor or liquid crystal production system mounting it. SOLUTION: When a structure provided with a holding section principally comprising Si on a ceramics heater is employed, soaking properties are enhanced on the holding surface and generation of particles can be suppressed. Furthermore, durability can be enhanced by coating at least the surface for holding an article to be processed. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2004363335(A) |
申请公布日期 |
2004.12.24 |
申请号 |
JP20030160162 |
申请日期 |
2003.06.05 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HASHIKURA MANABU;NAKADA HIROHIKO;HIIRAGIDAIRA HIROSHI;NATSUHARA MASUHIRO |
分类号 |
H05B3/74;C23C16/46;H01L21/02;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/02 |
主分类号 |
H05B3/74 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|