发明名称 HOLDER FOR SEMICONDUCTOR OR LIQUID CRYSTAL PRODUCTION SYSTEM AND SEMICONDUCTOR OR LIQUID CRYSTAL PRODUCTION SYSTEM MOUNTING IT
摘要 PROBLEM TO BE SOLVED: To provide a holder for a semiconductor or liquid crystal production system in which soaking properties are enhanced on the surface for holding an article to be processed, and to provide a semiconductor or liquid crystal production system mounting it. SOLUTION: When a structure provided with a holding section principally comprising Si on a ceramics heater is employed, soaking properties are enhanced on the holding surface and generation of particles can be suppressed. Furthermore, durability can be enhanced by coating at least the surface for holding an article to be processed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004363335(A) 申请公布日期 2004.12.24
申请号 JP20030160162 申请日期 2003.06.05
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HASHIKURA MANABU;NAKADA HIROHIKO;HIIRAGIDAIRA HIROSHI;NATSUHARA MASUHIRO
分类号 H05B3/74;C23C16/46;H01L21/02;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/02 主分类号 H05B3/74
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