发明名称 Optical proximity correction method and apparatus
摘要 Disclosed is a method for correcting a layout design using a design rule checker. The method includes providing a layout design file having the layout design that is to be corrected for optical proximity by the design rule checker. Providing a run set to the design rule checker. The run set includes a plurality of correction values that are used to correct a plurality of features of the layout design that have a selected space dimension. Identifying each of the plurality of features that have the selected space dimension. The method further includes correcting each of the plurality of features that have the selected space dimension with one correction value of the plurality of correction values of the run set. Preferably, the run set is generated from a correction table that has the plurality of correction values. <IMAGE>
申请公布号 EP0928012(B1) 申请公布日期 2005.07.06
申请号 EP19980106429 申请日期 1998.04.08
申请人 LSI LOGIC CORPORATION 发明人 GARZA, MARIO;JENSEN, JOHN V.;EIB, NICHOLAS K.;CHAO, KEITH K.
分类号 G03F1/00;G03F7/20;H01J37/302;H01L21/00;H01L21/027 主分类号 G03F1/00
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