| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a Co based sintered alloy sputtering target for forming a magnetic recording film which is less likely to generate particles. SOLUTION: As raw material powders, an oxide powder obtained by coating each surface of any one kind of oxide powder selected from TiO<SB>2</SB>powder, Ta<SB>2</SB>O<SB>5</SB>powder, Al<SB>2</SB>O<SB>3</SB>powder, MgO powders, ZrO<SB>2</SB>powder and Y<SB>2</SB>O<SB>3</SB>powder with a silicon dioxide layer of 1 to 20 vol.%; and an alloy powder containing two or more kinds selected from Cr powders, Pt, powders, Co powders, Cr, Pt and Co are prepared. These raw material powders are blended and mixed so as to have a composition comprising, by mol, 5 to 20% Cr, 5 to 25% Pt, and any one kind of oxide selected from TiO<SB>2</SB>, Ta<SB>2</SB>O<SB>5</SB>, Al<SB>2</SB>O<SB>3</SB>, MgO, ZrO<SB>2</SB>and Y<SB>2</SB>O<SB>3</SB>, and SiO<SB>2</SB>by 2 to 15% in total, and the balance Co powders, and the mixture is thereafter subjected to press sintering. COPYRIGHT: (C)2008,JPO&INPIT
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