| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device which achieve inexpensive exposure for forming colored pixels each including a transmission part and a reflection part different from each other in film thickness without subjecting a photomask to transmittance reducing treatment, and a method for producing a color filter for a semi-transmissive liquid crystal display device. <P>SOLUTION: Using a photomask having an opening pattern for light transmission parts and an opening pattern for light reflection parts which is larger than the opening pattern for light transmission parts, light from a light source is first passed through one of the opening pattern for light transmission parts and the opening pattern for light reflection parts, and with the light, one of the light transmission part forming area and light reflection part forming area of a photosensitive colored resin layer formed on a substrate is irradiated, the substrate is then moved to a position corresponding to the other of the opening pattern for light transmission parts and the opening pattern for light reflection parts, and is partially lapped on the other of the opening pattern for light transmission parts and the opening pattern for light reflection parts and is irradiated with the light. <P>COPYRIGHT: (C)2008,JPO&INPIT |
