| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of performing high accuracy exposure while preventing variance in the distance from a substrate end face to a pattern by directly measuring the position of the end face of a substrate mounted on a substrate stage with a laser length measuring device so as to determine a relative position of the substrate with respect to the mask with high accuracy. <P>SOLUTION: The exposure device PE includes a substrate stage 20 to hold a substrate W as an exposure object, a mask stage 10 to hold a mask M having an exposure pattern, and an irradiating means 30 to irradiate the substrate W with light for pattern exposure through the mask M, and further, the device is equipped with a measuring device 90 to measure a position of the substrate W held by the substrate stage 20 by measurement light. <P>COPYRIGHT: (C)2008,JPO&INPIT |
