| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of controlling the height of a reference mark and easily ensuring planarity. <P>SOLUTION: The exposure device comprises a reticle stage 105 for fixing a mark substrate with the mark formed and further, comprises a fixing mechanism 101 for absorbing the rear surface of the mark substrate and fixing the mark substrate to the stage in a detachable manner. A mark substrate holder 101 absorbs the whole rear surface of the mark substrate by an electrostatic chuck, with the structure same as that of a reticle holder 103 to fully reduce an influence of a deflection by own weight of the mark substrate. Thus, the flatness of the mark substrate is assured. <P>COPYRIGHT: (C)2008,JPO&INPIT |
