发明名称 Measuring apparatus including multi-wavelength interferometer
摘要 A measuring apparatus for measuring a position or a shape of a surface to be inspected includes a multi-wavelength interferometer and a control unit. The multi-wavelength interferometer includes an optical system that causes light to be inspected, which enters the surface to be inspected and is reflected by the surface to be inspected, and reference light to interfere with each other, a spectroscopic unit that divides interference light between the light to be inspected and the reference light into each wavelength, and a detector that detects the interference light and is provided for each divided interference light and an optical member that can adjust a position of a light guide portion that guides light from the spectroscopic unit to the detector. The control unit controls the optical member by using information related to inclination of the surface to be inspected to adjust the position of the light guide portion.
申请公布号 US9372068(B2) 申请公布日期 2016.06.21
申请号 US201213711289 申请日期 2012.12.11
申请人 Canon Kabushiki Kaisha 发明人 Hatada Akihiro;Kuramoto Yoshiyuki
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
代理机构 Canon USA Inc., IP Division 代理人 Canon USA Inc., IP Division
主权项 1. A measuring apparatus for measuring a position or a shape of a surface to be inspected, the measuring apparatus comprising: a multi-wavelength interferometer that uses a plurality of light fluxes including a light flux of a first wavelength and a light flux of a second wavelength different from the first wavelength; and a control unit that obtains a position or a shape of the surface to be inspected by using interference light signals detected by the multi-wavelength interferometer, wherein the multi-wavelength interferometer includes an optical system that causes an inspection light, which impinges on the surface to be inspected and is reflected by the surface to be inspected, and a reference light to interfere with each other with respect to the light flux of the first wavelength and the light flux of the second wavelength,a spectroscopic unit that divides interference light between the inspection light and the reference light into each wavelength of the first wavelength and the second wavelength,a first detector that detects the interference light of the first wavelength divided by the spectroscopic unit,a second detector that detects the interference light of the second wavelength divided by the spectroscopic unit,a first optical member including a first light guide portion that guides the interference light of the first wavelength to the first detector, and a second optical member including a second light guide portion that guides the interference light of the second wavelength to the second detector, wherein the control unit obtains a shift amount of a speckle pattern on a pupil plane between the first wavelength and the second wavelength of the interference light by using information related to inclination of the surface to be inspected and controls the first optical member and the second optical member to shift at least one of a position of the first light guide portion and a position of the second light guide portion on the basis of the obtained shift amount of the speckle pattern.
地址 Tokyo JP