FREE ABRASIVE POLISHING SLURRY AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a free abrasive polishing slurry achieving both of avoidance of selective polishing (or predetermined abrasion speed or higher) and avoidance of scratch and a manufacturing method therefor.SOLUTION: There is provided a free abrasive polishing slurry containing a flocculate body which is constituted by aggregating a plurality of coagulate bodies which is constituted by aggregating a plurality of single crystal diamond particles. The flocculate body is constituted by aggregating a plurality of coagulate bodies via a coagulant having HLB of 13 or more.SELECTED DRAWING: Figure 4