发明名称 WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To efficiently obtain a chip of stable quality.SOLUTION: A wafer processing method for cutting a wafer inside which a modified area is formed with laser light includes: grinding means of grinding a back surface of the wafer and removing the modified area while leaving micro cracks extended from the modified area; and polishing means of polishing the back surface of the wafer after the grinding.SELECTED DRAWING: Figure 14
申请公布号 JP2016225645(A) 申请公布日期 2016.12.28
申请号 JP20160160658 申请日期 2016.08.18
申请人 TOKYO SEIMITSU CO LTD 发明人 SHIMIZU TASUKU;OSHIDA SHUHEI;UEKIHARA AKIRA;FUJITA TAKASHI
分类号 H01L21/301;B23K26/53;B24B7/22;B24B37/34;H01L21/304 主分类号 H01L21/301
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