发明名称 |
WAFER PROCESSING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To efficiently obtain a chip of stable quality.SOLUTION: A wafer processing method for cutting a wafer inside which a modified area is formed with laser light includes: grinding means of grinding a back surface of the wafer and removing the modified area while leaving micro cracks extended from the modified area; and polishing means of polishing the back surface of the wafer after the grinding.SELECTED DRAWING: Figure 14 |
申请公布号 |
JP2016225645(A) |
申请公布日期 |
2016.12.28 |
申请号 |
JP20160160658 |
申请日期 |
2016.08.18 |
申请人 |
TOKYO SEIMITSU CO LTD |
发明人 |
SHIMIZU TASUKU;OSHIDA SHUHEI;UEKIHARA AKIRA;FUJITA TAKASHI |
分类号 |
H01L21/301;B23K26/53;B24B7/22;B24B37/34;H01L21/304 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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