发明名称 Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
摘要 A polymeric compound having the formula <IMAGE> wherein x ranges from about 0.05 to about 0.5 y ranges from about 0.80 to about 0.35 z ranges from about 0.10 to about 0.25 n ranges from about 50 to about 1500 R is selected from the group consisting of phenyl and C1 to C4 alkyl substituted phenyl; K is selected from the group consisting of <IMAGE> -S-, -O-, and -CH2-, or is absent; P and P1 are selected from the group consisting of C1 to C4 alkyl, methoxy, ethoxy, butoxy, and H; and P1 may be the same as P or different.
申请公布号 US5200291(A) 申请公布日期 1993.04.06
申请号 US19910684547 申请日期 1991.04.11
申请人 HOECHST CELANESE CORPORATION 发明人 WANAT, STANLEY F.
分类号 C08F8/30;C08F8/44;G03F7/027 主分类号 C08F8/30
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