发明名称 Composition and process for forming electrically insulating thin films
摘要 To provide a composition and process for forming insulating films that can produce insulating films having low dielectric constants. The composition comprises (A) an electrically insulating curable inorganic or organic resin, (B) a solvent, and (C) at least one solvent-soluble substance (excluding the solvent used for component (B)) that upon heating or by interaction with the resin (A) can generate gas or undergo volatilization in the temperature range from 0 DEG C. to 800 DEG C. The insulating films are prepared by coating the surface of a substrate the composition; evaporating the solvent; and subsequently heating the substrate in order to generate gas from component (C) during the course of or after the cure of the said resin (A).
申请公布号 US6149966(A) 申请公布日期 2000.11.21
申请号 US19980120384 申请日期 1998.03.31
申请人 DOW CORNING TORAY SILICONE CO., LTD. 发明人 KOBAYASHI, AKIHIKO;MINE, KATSUTOSHI;NAKAMURA, TAKASHI;SASAKI, MOTOSHI;SAWA, KIYOTAKA
分类号 C09D5/25;C09D7/12;C09D125/02;C09D127/12;C09D129/10;C09D179/08;C09D183/04;C09D183/05;C09D201/00;H01B3/30;H01B3/42;H01B3/46;H01L21/312;H01L21/316;(IPC1-7):B05D3/02;B05D5/12 主分类号 C09D5/25
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