发明名称 SEMICONDUCTOR SPINNER EQUIPMENT AND POST EXPOSURE BAKING METHOD USING THE SAME
摘要 <p>A semiconductor spinner apparatus and a post exposure baking method using the same are provided to shorten efficiently a post exposure baking delay time by performing respectively wafer loading/unloading processes. A post exposure baking unit bakes a wafer at a constant level of temperature. A first transfer unit(310) loads the wafer into the post exposure baking unit. A second transfer unit(320) unloads the baked wafer from the post exposure baking unit. A standby unit is installed around the post exposure baking unit. The first transfer unit is in a standby state in the standby unit. A control unit controls the first transfer unit in the standby state, and controls transferring operations of the first and second transfer units.</p>
申请公布号 KR20080080793(A) 申请公布日期 2008.09.05
申请号 KR20070020971 申请日期 2007.03.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, WON JO
分类号 H01L21/677 主分类号 H01L21/677
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