发明名称 |
SEMICONDUCTOR SPINNER EQUIPMENT AND POST EXPOSURE BAKING METHOD USING THE SAME |
摘要 |
<p>A semiconductor spinner apparatus and a post exposure baking method using the same are provided to shorten efficiently a post exposure baking delay time by performing respectively wafer loading/unloading processes. A post exposure baking unit bakes a wafer at a constant level of temperature. A first transfer unit(310) loads the wafer into the post exposure baking unit. A second transfer unit(320) unloads the baked wafer from the post exposure baking unit. A standby unit is installed around the post exposure baking unit. The first transfer unit is in a standby state in the standby unit. A control unit controls the first transfer unit in the standby state, and controls transferring operations of the first and second transfer units.</p> |
申请公布号 |
KR20080080793(A) |
申请公布日期 |
2008.09.05 |
申请号 |
KR20070020971 |
申请日期 |
2007.03.02 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, WON JO |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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