FACING TARGET TYPE SPUTTERING APPARATUS,申请号KR20000023000-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	FACING TARGET TYPE SPUTTERING APPARATUS
摘要
申请公布号	KR20010098215(A)	申请公布日期	2001.11.08
申请号	KR20000023000	申请日期	2000.04.28
申请人	KIM, KYUNG HWAN	发明人	KIM, KYUNG HWAN
分类号	C23C14/34;(IPC1-7):C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

您可能感兴趣的专利

CONSTRUCTION METHOD FOR CONCRETE OUTER TANK LOW-TEMPERATURE TANK

LOUVER TYPE BLIND

MANUFACTURE AND CONSTRUCTION OF PATTERN-PROVIDED SOUNDPROOFING WALL

TEMPORARY ROOF FOR REINFORCED CONCRETE BUILDING WORK

SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURE

TRISULFIDE NIOBIUM CONTAINING CATALYST FOR HYDROREFINING HYDROCARBON CRUDE OIL AND HYDROREFINING PROCESS USING SAID CATALYST

SYNCHRONOUS DRAM

PRODUCTION OF ALUMINUM FOIL USED AS ANODE OF ELECTROLYTIC CAPACITOR

CONJUGATED POLYMER FLUORESCENCER AND ORGANIC EL DEVICE

PRODUCTION OF POROUS CERAMIC MATERIAL

VEHICLE STRUCTURE FOR STRIDING TYPE VEHICLE

FEEDFORWARD DISTORTION COMPENSATION AMPLIFIER

METHOD FOR DECORATING THREE-DIMENSIONAL BODY AND SHRINKABLE TRANSFER MATERIAL

AMMUNITION SUPPLY DEVICE FOR GUN

CONSTRUCTION FACILITY FOR UNDERWATER STRUCTURE

PICK FINDING DEVICE