MANUFACTURING METHOD OF POLYCRYSTALLINE SILICON THIN FILM, POLYCRYSTALLINE SILICON THIN FILM SUBSTRATE AND POLYCRYSTALLINE SILICON THIN FILM TYPE SOLAR BATTERY

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a polycrystalline silicon thin film capable of improving conversion efficiency, a polycrystalline silicon thin film substrate and a polycrystalline silicon thin film type solar battery.

SOLUTION: The manufacturing method of the polycrystalline silicon thin film comprises a process of forming an amorphous silicon layer 2 on a glass substrate 1, a process of forming an aluminum layer 3 composed of a metal which eutectically reacts with silicon on the amorphous silicon layer 2, and a process of heating a laminated substrate. By the heating, the amorphous silicon of the amorphous silicon layer 2 is dissolved in the aluminum layer 3 and crystallized to form a polycrystalline silicon layer 4. The polycrystalline silicon thin film substrate 40 which has the aluminum layer 3 formed on the glass substrate 1 and the polycrystalline silicon layer 4 formed on the aluminum layer 3 is obtained.

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