| 摘要 |
PURPOSE:To provide the method for formation of the optical thin film for the purpose of obtaining the optical thin film having a compressive stress and an intermediate refractive index. CONSTITUTION:The inside of a chamber 3 is heated to >=200 deg.C and the inside of the heated chamber 3 is evacuated to a high vacuum degree of <=2.0X10<-5>Torr by a low-vacuum pump 901 and a high-vacuum pump 903 at the time of forming the optical thin film by sticking silicon monoxide onto a substrate within the chamber 3. Oxygen is introduced via a gas feed pipe 1301 from an oxygen generating source into the chamber 3 set under the vacuum degree described above and the inside of the chamber 3 introduced with this oxygen is evacuated to a high vacuum degree of >=5.0X10<-5>Torr by the high- vacuum pump 903. The heating temp. of the silicon monoxide 17 by an evaporating source and the distance between the substrate 15 and an evaporating source 7 are properly set so set that the silicon monoxide described above is deposited by evaporation at 0.2 to 0.5nm/sec on the substrate within the chamber 3 evacuated to the high vacuum degree of >=5.0X10<-5>Torr. |
