| 摘要 |
<p>PURPOSE: To avoid the oxidation of a Faraday cup and suppress the contamination of a substrate holder which is caused by the reflection of an electron beam and secondary electrons by a method wherein an idle exposure cup is provided at the position on the substrate holder where the Faraday cup does not exist and the beam application is continued until the drift of the electron beam is stabilized. CONSTITUTION: Both 8 substrate holder 3 and a Faraday cup 5 are made of Ti. An idle exposure cup 6 is provided on the lower part frame 7 of the substrate holder 3 at the symmetrical position of the Faraday cup 5. The idle exposure cup 6 is made of BeCu and has the same size and shape as the Faraday cup 5 and can be attached/detached to/from the substrate holder 3. With this constitution, the idle exposure can be performed until the operation of an aligner is stabilized while the contamination of the substrate holder is suppressed, so that the pattern precision can be improved.</p> |
