发明名称 METHOD FOR MANUFACTURING WIRING SUBSTRATE
摘要 A method for manufacturing a wiring substrate by an electroless plating method that precipitates metal without using a plating resist is provided. The method includes the steps of: (a) providing a catalyst layer having a predetermined pattern on a substrate; (b) dipping the substrate in an electroless plating solution to thereby precipitate metal on the catalyst layer to provide a first metal layer; (c) exposing a top surface of the substrate to steam; and (d) dipping the substrate in an electroless plating solution to thereby precipitate metal on the first metal layer to provide a second metal layer.
申请公布号 US2007218191(A1) 申请公布日期 2007.09.20
申请号 US20070680846 申请日期 2007.03.01
申请人 SEIKO EPSON CORPORATION 发明人 FURIHATA HIDEMICHI;KIMURA SATOSHI;KANEDA TOSHIHIKO;KIJIMA TAKESHI
分类号 B05D5/12 主分类号 B05D5/12
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